OPTIONS 選項
Free standing or can be integrated into any OAI 獨立或可集成到任何OAI
lithography system 光刻系統(tǒng)
Variety of tooling modules available 可提供多種模具模塊
Height adjustable LS stand available 高度可調(diào)的LS站
Single or multiple wavelength 單波長或多波長
FEATURES 特性
Beam size 4” to 12” sg. 尺寸為4 "到12 " sg
Wave length 365um, 405um or dual wave length 波長365um,, 405um或雙波長
Dual Wave Length Tuning available 可進(jìn)行雙波長調(diào)協(xié)
Beam uniformity better than +/- 4% 光束均勻性優(yōu)于+/- 4%
Beam intensity up to ~25mW/cm2 光束強(qiáng)度可達(dá)~25mW/cm2
Easy to use touch screen interface 易于使用的觸摸屏界面
Collimation angle <= 2 degrees 準(zhǔn)直角< <= 2度
Dose control and timed exposure 劑量控制和定時曝光
USB remote interface for PC control USB遠(yuǎn)程接口的PC控制
Long working 長時間的工作